Comparison between Laser Induced Damage Threshold (LIDT) of undoped zinc oxide, indium doped zinc oxide dielectric and aluminium doped zinc oxide dielectrics for use in ultrafast laser system

Ultrafast laser systems make use of a number of optical components. These include dielectrics and dielectric coated optical components, which have high laser induced damage threshold and thermal resistivity. It is important to study the laser induced damage threshold of these materials because they

Project Title

Comparison between Laser Induced Damage Threshold (LIDT) of undoped zinc oxide, indium doped zinc oxide dielectric and aluminium doped zinc oxide dielectrics for use in ultrafast laser systems

Project Area of Specialization

Robotics

Project Summary

Ultrafast laser systems make use of a number of optical components. These include dielectrics and dielectric coated optical components, which have high laser induced damage threshold and thermal resistivity. It is important to study the laser induced damage threshold of these materials because they are exposed to ultrafast lasers in femtosecond, picosecond and nanosecond range, and if the materials are damaged, the laser system operation can be affected adversely. The most often used dielectric materials in ultrafast laser systems are fused silica and hafnium oxide. However, laser technology is ever evolving with more and more powerful lasers being brought into market for various purposes. This calls for constant upgradation of the materials used within the laser technology to ensure minimum limitation from the optical components.

Project Objectives

This study is an attempt to evaluate the properties of zinc oxide in its pure and doped forms to investigate whether or not these thin films can be of potential use in laser systems. We can further find out the optimum range for which the investigated compounds can be used as a cost-efficient substitute in a laser system of that power. The study aims to explore and compare the laser induced damage threshold of undoped zinc oxide, indium doped zinc oxide and aluminium doped zinc oxide to determine the dielectric that would function best as a dielectric mirror in an ultrafast laser system, and also determine which range of laser pulse can they be used best in. Alongside, I wish to compare this data with the existing data of LIDT of fused silica and hafnium oxide to find out if any of our studied materials can replace one of these in the existing ultrafast laser systems as a more affordable and efficient alternative.
 

Project Implementation Method

To achieve the described goals above, the following experimental steps may be taken:
Step 1: Preparation of Thin Film
In order to investigate the physical properties of the mentioned materials, we first need to grow them as a thin film upon which further experimentation will be done to provide us with the desired data. These films may be produced on glass or metal.
The method of deposition of thin film that can be used for this is the sol gel deposition method. We choose this method in particular since it is cost efficient and also provides an even film perfect for this investigation.

Step 2: Exposure to laser fluence
The prepared films will then be exposed to laser fluence of femtosecond, picosecond and nanosecond range.
Step 3: Study of Laser Induced Damage Threshold
Thereafter, the three films which have been exposed to laser fluence will be subjected to laser induced damage tests in order to investigate the extent of laser damage and to determine the laser induced damage threshold.
The testing methods that may be used for this are 1-on-1 laser test, Ruster Scan, and S-on-1 laser test. Each of these have their own pros and drawbacks. Following all three tests will allow us to have a better and more complete picture for our investigation.

Step 4: Comparing data
The obtained data for the films can now be compared with the available data for fused silica and hafnium oxide to determine whether any of these materials can be used in laser systems, the laser fluence that they can tolerate, improvement/deterioration of properties of material with doping and the range of laser power in which they may be used as optical components of a laser system. We can also determine and compare various other properties of these materials to evaluate their usage in optoelectronic, electronics and semiconductor industries.

Benefits of the Project

Laser systems have a very versatile usage ranging from the study of our early universe to micromachining used in electronics etc. Optical components can prove to be the limiting factor in the functioning and outcomes brought about by laser and plasma. Materials of high LIDT can improve the performance of these laser systems and in turn, improve the quality and precision of micromachining in particular. It can also aid in the overall better performance for the laser system which can be used for various studies and advancements in the semiconductor and electronics industries.

Technical Details of Final Deliverable

As the final deliverable, we will have a thin film of semiconductors that can be used in laser systems. The study allows us to evaluate the properties of this film and what needs to be done to maximize its usage for the robust operation of laser systems.

Final Deliverable of the Project

Hardware System

Core Industry

Manufacturing

Other Industries

Core Technology

Others

Other Technologies

Sustainable Development Goals

Quality Education

Required Resources

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